Webpage:
Time:
Venue:
- A-212 (STCS Seminar Room)
Organisers:
I will introduce the problem of mask design in a lithographic process from a systems perspective and show how it can be reduced to a non-linear optimization problem. I will also show the benefit of phase shift mask over the binary mask with some examples. Lastly, I will show how a complex mask can be replaced by successive real valued masks (double exposure theorem).