Phase Shifting Masks for Microlithography



Friday, 18 May 2012, 15:00 to 16:30


  • A-212 (STCS Seminar Room)


I will introduce the problem of mask design in a lithographic process from a systems perspective and show how it can be reduced to a non-linear optimization problem. I will also show the benefit of phase shift mask over the binary mask  with some examples. Lastly, I will show how a complex mask can be replaced by successive real valued masks (double exposure theorem).